Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth

L. M. Belova, James C. Eckert, J. J. L. Mulders, C. Christophersen, E. D. Dahlberg, and A. Riazanova

Nanotechnology 22 (2011) 145305


A new method of direct, rapid nano- to micro-scale patterning of high purity cobalt is presented. The method utilizes a combination of electron beam induced deposition (EBID) and seeded growth at elevated temperatures below the temperature of spontaneous thermal decomposition. Dicobalt octacarbonyl \( \mathrm{Co_{2}(CO)_{8}}\) is used as the precursor and carbon as a seed layer. Seeded deposition is carried out in the substrate temperature range from 55 to 75°C. Deposition yield is significantly higher than conventional EBID and magnetotransport measurements indicate that resistivity, \( 22~{\mu\Omega}~\mathrm{cm} \), and saturation magnetization, 1.55 T, are much closer to the corresponding values for bulk Co than those for standard EBID.